349 nm

SKYLARK 349

349 nm single frequency diode-pumped solid-state laser system delivering the highest ultraviolet power from a DPSS platform.

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Reliable power

400 mW

Up to 400 mW of efficient ultraviolet light at 349 nm, providing power margin for high throughput tasks.

TEM₀₀ mode

M² ≤ 1.1

Delivers a clean mode with ellipticity > 95%, providing uniform spatial quality and low noise output.

Stable output

± 0.2 pm

Maintains ± 0.2 pm wavelength stability with mode-hop-free operation over 10s of hours.

"The Skylark 349 laser delivers clean excitation at 3.55 eV and is an excellent replacement for an Argon laser at 351 nm."

PROFESSOR IVAN IVANOV, LINKÖPING UNIVERSITY

Skylark 349 CW DPSS laser

The Skylark 349 CW DPSS laser provides ultra-stable single frequency UV light at 349 nm.

Engineered for consistent long-term, stable performance, delivering up to 400 mW of ultra-stable output, low noise, and spectral purity.

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Key specifications

Wavelength

349 nm

Output power

up to 400 mW

Spectral bandwidth

≤ 500 kHz

Spatial mode

TEM₀₀

Operational mode

CW, SLM

Beam parameters

Beam height

90.0 mm

Beam diameter

1.0 - 1.5 mm

Beam quality

M² ≤ 1.1

Beam divergence

≤ 1.0 mrad, diffraction limited

Beam pointing stability

≤ 5 μrad/°C

Coherence length

> 100 m

Polarisation ratio

≥ 100:1, vertical

0 hours

2,000 hours

Laser performance

Spectral stability (8 hours)

± 0.2 pm

Power stability (8 hours)

≤ 2.0 % pk-pk

Power noise (10 Hz - 10 MHz)

≤ 0.3% RMS

Laser control

Control interface

Web-based GUI

Control connectivity

Ethernet (TCP/IP) + digital I/O

Safety features

Interlock, mechanical shutter

Laser dimensions

Laser system (L x W x H)

425 x 200 x 123 mm

Operating conditions

Warm up time

5 - 30 mins

Ambient temperature

18 - 30 °C

Laser interface stability

± 1.5 °C

Storage

0 - 50 °C

Humidity

5 - 95 %, non-condensing

Power consumption (typical)

< 50 W

APPLICATIONS

Robust, ultra-stable ultraviolet laser delivering uniform light for materials research and high throughput manufacturing

Inspection and characterisation

Collect data with precision, leveraging uniform power and a high quality beam.
The Skylark 349 UV provides an excitation source for applications such as:

  • Semiconductor materials characterisation
  • Wide bandgap materials (e.g. SiC, GaN, AlN)
  • UV Raman
  • Photoluminescence (PL)

Process and fabrication

Develop consistent, detailed patterns over large areas without compromising quality.

The Skylark 349 ultraviolet laser at 349 nm powers applications such as:

  • Laser interference lithography
  • Photoluminescence (PL)
  • Wide bandgap materials inspection (e.g. SiC, GaN, AlN)
  • UV interferometry
  • Wafer inspection

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Leverage the highest power, single frequency ultraviolet light at 349 nm built on a stable and reliable DPSS laser platform. Get in touch to tailor a laser to your application.

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